Electrical characteristics of nitrogen incorporated hydrogenated amorphous carbon

D. P. Magill; A. A. Ogwu; J. A. McLaughlin; P. D. Maguire; R. W. McCullough; D. Voulot; D. Gillen

doi:10.1116/1.1387078

Electrical characteristics of nitrogen incorporated hydrogenated amorphous carbon

D. P. Magill, A. A. Ogwu, J. A. McLaughlin, P. D. Maguire, R. W. McCullough, D. Voulot, D. Gillen

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

The electrical and emission properties of nitorgen doped hydrogenated amophous carbon films were investigated for stress reducing and improving field emission properties. These films were prepared by plasma enhanced chemical vapor deposition under biased voltages and doping in an atomic nitrogen flux from radiofrequency plasmas. The surface morphology, film thickness and surface contact measurements were carried out using x-ray photoelectron spectroscopy, atomic force spectroscopy, surface profiling techniques and Kelvin probe method. The extraction of density of states and electrical conductivity at the fermi level were also determined.

Original language	English
Pages (from-to)	2456-2462
Number of pages	7
Journal	Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume	19
Issue number	5
DOIs	https://doi.org/10.1116/1.1387078
Publication status	Published - Sept 2001
Externally published	Yes

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1116/1.1387078

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AU - Magill, D. P.

AU - Ogwu, A. A.

AU - McLaughlin, J. A.

AU - Maguire, P. D.

AU - McCullough, R. W.

AU - Voulot, D.

AU - Gillen, D.

PY - 2001/9

Y1 - 2001/9

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AB - The electrical and emission properties of nitorgen doped hydrogenated amophous carbon films were investigated for stress reducing and improving field emission properties. These films were prepared by plasma enhanced chemical vapor deposition under biased voltages and doping in an atomic nitrogen flux from radiofrequency plasmas. The surface morphology, film thickness and surface contact measurements were carried out using x-ray photoelectron spectroscopy, atomic force spectroscopy, surface profiling techniques and Kelvin probe method. The extraction of density of states and electrical conductivity at the fermi level were also determined.

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ER -

Electrical characteristics of nitrogen incorporated hydrogenated amorphous carbon

Abstract

All Science Journal Classification (ASJC) codes

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