TY - GEN
T1 - Evolution of microstructure and wear properties of aluminum thin films with sputtering substrate temperature
AU - Mwema, Fredrick M.
AU - Akinlabi, Esther T.
AU - Oladijo, Oluseyi P.
AU - Dutta Majumdar, J.
N1 - Publisher Copyright:
© 2019 IEEE.
PY - 2019/5/13
Y1 - 2019/5/13
N2 - The influence of sputtering substrate temperature on the microstructure and wear properties of aluminum thin films deposited on stainless steel substrates by radio-frequency (RF) magnetron sputtering was studied. The aluminum films were deposited on stainless steel substrates at different temperatures of 70°C, 80°C and 100°C and at a constant power of 300 W. The surfaces of the films were then characterized by field emission scanning electron microscopy (FESEM), X-ray diffraction (XRD), surface profiling and wear methods. The wear was undertaken at extremely high sliding load of 50 N. Fine-grained and smooth microstructures exhibiting hillocks were observed at 70°C whereas coarse-grained and rough microstructures consisting of porous structures were obtained at 100°C. Defect-free and well-defined microstructures were obtained at 80°C. All the films obtained within this range of temperatures were crystalline according to the XRD results. Films obtained at 80°C were shown to have the highest coefficient of friction whereas those deposited at 100°C exhibited the lowest wear resistance. The films' failure along the edges of the balls under high sliding load were characterized by thinning, deformation and tearing (cracking).
AB - The influence of sputtering substrate temperature on the microstructure and wear properties of aluminum thin films deposited on stainless steel substrates by radio-frequency (RF) magnetron sputtering was studied. The aluminum films were deposited on stainless steel substrates at different temperatures of 70°C, 80°C and 100°C and at a constant power of 300 W. The surfaces of the films were then characterized by field emission scanning electron microscopy (FESEM), X-ray diffraction (XRD), surface profiling and wear methods. The wear was undertaken at extremely high sliding load of 50 N. Fine-grained and smooth microstructures exhibiting hillocks were observed at 70°C whereas coarse-grained and rough microstructures consisting of porous structures were obtained at 100°C. Defect-free and well-defined microstructures were obtained at 80°C. All the films obtained within this range of temperatures were crystalline according to the XRD results. Films obtained at 80°C were shown to have the highest coefficient of friction whereas those deposited at 100°C exhibited the lowest wear resistance. The films' failure along the edges of the balls under high sliding load were characterized by thinning, deformation and tearing (cracking).
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U2 - 10.1109/ICMIMT.2019.8712046
DO - 10.1109/ICMIMT.2019.8712046
M3 - Conference contribution
AN - SCOPUS:85066486165
T3 - 2019 IEEE 10th International Conference on Mechanical and Intelligent Manufacturing Technologies, ICMIMT 2019
SP - 31
EP - 36
BT - 2019 IEEE 10th International Conference on Mechanical and Intelligent Manufacturing Technologies, ICMIMT 2019
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 10th IEEE International Conference on Mechanical and Intelligent Manufacturing Technologies, ICMIMT 2019
Y2 - 15 February 2019 through 17 February 2019
ER -