TY - JOUR
T1 - Microstructure and surface profiling study on the influence of substrate type on sputtered aluminum thin films
AU - Mwema, F. M.
AU - Akinlabi, E. T.
AU - Oladijo, O. P.
N1 - Publisher Copyright:
© 2019 Elsevier Ltd. All rights reserved. Selection and peer-review under responsibility of the scientific committee of the 10th International Conference of Materials Processing and Characterization.
PY - 2020
Y1 - 2020
N2 - In this article, the influence of the type of substrates on properties of aluminum thin films prepared through sputtering technology is presented. The deposition was undertaken at constant substrate temperature of 90 °C and RF power of 350 W for 2 h on glass and steel substrates. Microstructural properties were analyzed using field emission scanning electron microscopy (FESEM). The optical non-contact surface profiler (OSP) was used to study the topology and roughness characteristics of the films on different substrates. The results show that films grown on mild and stainless-steel substrates exhibited different morphologies and surface topology from those grown on glass substrates, indicating the influence of the substrate type on the deposition, nucleation, growth and film formation of Al thin films.
AB - In this article, the influence of the type of substrates on properties of aluminum thin films prepared through sputtering technology is presented. The deposition was undertaken at constant substrate temperature of 90 °C and RF power of 350 W for 2 h on glass and steel substrates. Microstructural properties were analyzed using field emission scanning electron microscopy (FESEM). The optical non-contact surface profiler (OSP) was used to study the topology and roughness characteristics of the films on different substrates. The results show that films grown on mild and stainless-steel substrates exhibited different morphologies and surface topology from those grown on glass substrates, indicating the influence of the substrate type on the deposition, nucleation, growth and film formation of Al thin films.
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U2 - 10.1016/j.matpr.2020.02.309
DO - 10.1016/j.matpr.2020.02.309
M3 - Conference article
AN - SCOPUS:85089026370
SN - 2214-7853
VL - 26
SP - 1496
EP - 1499
JO - Materials Today: Proceedings
JF - Materials Today: Proceedings
IS - Part 2
T2 - 10th International Conference of Materials Processing and Characterization, ICMPC 2020
Y2 - 21 February 2020 through 23 February 2020
ER -