Abstract
Boron phosphide films prepared by PECVD have been characterised as a function of phosphine flow rate during deposition. The films were characterised by x-ray photoelectron spectroscopy (XPS), Atomic force microscopy (AFM), Nano-indentation and Scanning electron microscopy. The effect of phosphine flow rate during deposition on the dispersive, polar and acid-base components of the surface energy of the films was investigated. The components of the surface energy were determined by the Owens-Wendt (OW) and the Van-Oss-Chaudhry-Good (VOCG) methods. Both the Lifshitz-Van der Waaals dispersive interaction and the electron donor/electron acceptor acid-base components were found to depend on the phosphine flow rate during film preparation. Our results indicate the potential of Boron Phosphide films for tribological and engineering applications beyond their current application as protective coatings for soft infra-red transmitting substrates.
| Original language | English |
|---|---|
| Article number | 14 |
| Pages (from-to) | 130-136 |
| Number of pages | 7 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 5786 |
| DOIs | |
| Publication status | Published - 2005 |
| Externally published | Yes |
| Event | Window and Dome Technologies and Materials IX - Orlando, FL, United States Duration: Mar 28 2005 → Mar 29 2005 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering