TY - JOUR
T1 - Tuning linear and nonlinear optical properties of Se70Te20Sb10 thin films via 3 MeV proton irradiation for photonic applications
AU - Matabana, Thabang K.
AU - Muiva, Cosmas M.
AU - Madhuku, Morgan
AU - Mehta, Neeraj
AU - Benjamin, Lawrence K.
AU - Mosimanegape, Thobega
AU - Sebuso, Dineo P.
AU - Tabi, Conrad B.
N1 - Publisher Copyright:
© 2025 Elsevier Ltd
PY - 2026/1
Y1 - 2026/1
N2 - This study aims to investigate how 3 MeV proton irradiation influences the structural, linear, and nonlinear optical properties of Se70Te20Sb10 thin films, with the goal of assessing their potential for photonic device applications. Thin films were thermally deposited by electron-beam evaporation and exposed to proton fluences ranging from 5 × 1013 to 5 × 1016 ions/cm2. X-ray diffraction and Field Emission Scanning Electron Microscope (FESEM) confirmed the amorphous structure of the films across all fluences. while AFM revealed a substantial increase in surface roughness from 40.5 nm (as-grown) to 386.7 nm at the highest fluence, indicating irradiation-induced morphological reorganization. Optical characterization showed that transmittance and reflectance decreased with increasing fluence, while the absorption coefficient (α) in the 1.5–2.5 eV range increased. The optical band gap (Eg) exhibited a non-linear dependence, decreasing from 1.298 eV (as-grown) to 1.281 eV at 5 × 1014 ions/cm2 then rising to 1.389 eV at 5 × 1015 ions/cm2, and then reducing again at the highest fluence. Urbach energy (Eu) varied complementarily, reflecting disorder–recovery dynamics. The third-order nonlinear susceptibility χ3 peaked at 1.803 × 10−11 esu, with corresponding enhancement in the nonlinear refractive index n2. Dielectric functions and energy loss spectra further confirmed fluence-dependent changes in electronic response. These findings demonstrate that Sb-stabilized Se–Te alloys exhibit tunable optical properties under proton irradiation, making them promising candidates for radiation-hardened optoelectronic and photonic devices.
AB - This study aims to investigate how 3 MeV proton irradiation influences the structural, linear, and nonlinear optical properties of Se70Te20Sb10 thin films, with the goal of assessing their potential for photonic device applications. Thin films were thermally deposited by electron-beam evaporation and exposed to proton fluences ranging from 5 × 1013 to 5 × 1016 ions/cm2. X-ray diffraction and Field Emission Scanning Electron Microscope (FESEM) confirmed the amorphous structure of the films across all fluences. while AFM revealed a substantial increase in surface roughness from 40.5 nm (as-grown) to 386.7 nm at the highest fluence, indicating irradiation-induced morphological reorganization. Optical characterization showed that transmittance and reflectance decreased with increasing fluence, while the absorption coefficient (α) in the 1.5–2.5 eV range increased. The optical band gap (Eg) exhibited a non-linear dependence, decreasing from 1.298 eV (as-grown) to 1.281 eV at 5 × 1014 ions/cm2 then rising to 1.389 eV at 5 × 1015 ions/cm2, and then reducing again at the highest fluence. Urbach energy (Eu) varied complementarily, reflecting disorder–recovery dynamics. The third-order nonlinear susceptibility χ3 peaked at 1.803 × 10−11 esu, with corresponding enhancement in the nonlinear refractive index n2. Dielectric functions and energy loss spectra further confirmed fluence-dependent changes in electronic response. These findings demonstrate that Sb-stabilized Se–Te alloys exhibit tunable optical properties under proton irradiation, making them promising candidates for radiation-hardened optoelectronic and photonic devices.
KW - Chalcogenide thin films
KW - First-order nonlinear susceptibility
KW - Optical band gap
KW - Physical parameters
KW - Proton irradiation
KW - Se-Te-Sb
KW - Thin films
KW - Third-order nonlinear susceptibility
UR - https://www.scopus.com/pages/publications/105015382579
UR - https://www.scopus.com/inward/citedby.url?scp=105015382579&partnerID=8YFLogxK
U2 - 10.1016/j.mssp.2025.110040
DO - 10.1016/j.mssp.2025.110040
M3 - Article
AN - SCOPUS:105015382579
SN - 1369-8001
VL - 201
JO - Materials Science in Semiconductor Processing
JF - Materials Science in Semiconductor Processing
M1 - 110040
ER -